HITACHI SU9000 Ultra-High Resolution SEM

Cold Field Emission source, ideal for high-resolution imaging with a small source size and energy spread
Innovative CFE Gun technology, for superior beam brightness and stability, affording high-resolution imaging and high-quality elemental analysis
Unique object lens design has a capability of EELS and diffraction as well

The world’s highest SE resolution of 0.4 nm at 30 kV is guaranteed
Usable magnification of up to 3,000,000x
Newly designed CFE GUN provides high brightness and an extremely stable emission current
Superior low kV performance for observing beam sensitive materials
Next generation Hitachi In-Lens SEM optics allows for routine observation at 1,000,000x
Improved vacuum technology that allows for UHV levels for reduced sample contamination
Highly engineered instrument enclosure featuring both superior strength and stability to allow for high resolution imaging in a broad range of environmental conditions
Newly designed objective lens enables high resolution imaging at a low acceleration voltage
Side entry sample exchange system increases throughput by reducing the time required to change samples and automatically positioning the sample at the current WD

Sample : Multi wall carbon nano tube (lattice fringes)

Vacc : 30 kV

Mag. : 2,000kx

Bright Field(BF)-STEM image